Artificial sunlight and ultraviolet light induced photo-epoxidation of propylene over V-Ti/MCM-41 photocatalyst

• Van-Huy Nguyen,
• Shawn D. Lin,
• Jeffrey Chi-Sheng Wu and
• Hsunling Bai

Beilstein J. Nanotechnol. 2014, 5, 566–576, doi:10.3762/bjnano.5.67

• . Over V-Ti/MCM-41 photocatalyst, the propylene oxide (PO) formation rate is 193.0 and 112.1 µmol·gcat−1·h−1 with a PO selectivity of 35.0 and 53.7% under UV light and artificial sunlight, respectively. A normalized light utilization (NLU) index is defined and found to correlate well with the rate of

• tested in this study. Keywords: artificial sunlight; light irradiation effects; photo-epoxidation; ultraviolet (UV) light; V-Ti/MCM-41 photocatalyst; Introduction It is agreed that light, especially its wavelength spectrum and intensity, is a crucial factor for efficient photocatalysis. A

• ]. In our previous study, V-Ti/MCM-41 photocatalyst showed good PO yield under UV light [17]. However, the effects of light irradiation on the photo-epoxidation of propylene have not been systematically examined. Yamashita et al. carried out photo-epoxidation experiments by using a high-pressure mercury